Analysis of Crystalline Defects Caused by Growth on Partially Planarized Spalled (100) GaAs Substrates

نویسندگان

چکیده

We analyze the effect of growth on non-(100) surfaces resulting from incomplete planarization spalled GaAs wafers defect structure solar cell layers grown by hydride vapor phase epitaxy (HVPE). Controlled spalling (100)-oriented has potential to reduce substrate costs for III-V epitaxy; however, it creates regularly faceted that may complicate high-quality optoelectronic devices. leverage anisotropic rate HVPE planarize these substrates, reducing surface roughness and degree faceting. observe degraded performance material quality in sample areas where facets are not completely removed. used dark lock-in thermography photoluminescence identify recombination were fully planarized. cathodoluminescence presence extended defects regions, which correlated with bandgap fluctuations material. hypothesize created strain compositional ternary alloys surfaces. This work elucidates issues cells builds understanding toward realizing high photovoltaics cost-reduction controlled spalling.

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ژورنال

عنوان ژورنال: Crystals

سال: 2023

ISSN: ['2073-4352']

DOI: https://doi.org/10.3390/cryst13040681